ICSMV 2026
Professor Masakazu Kobayashi
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Professor Masakazu Kobayashi
Masakazu Kobayashi received the B.Eng. degree from Waseda University, in 1983, and the Dr. Eng. degree from Tokyo Institute of Technology in 1988. Then he joined a MBE group of Purdue University, and later he moved to Chiba University in 1992. In 2000, he moved to Waseda University as a full professor.
He has been working on molecular beam epitaxy since he was a senior student of the undergraduate program. He worked on the MBE growth of InGaAlSb, ZnSe:Mn DC Electroluminescence devices, ZnSe-ZnTe strained layer superlattices, and the injection type blue-green laser diode consisting of ZnSe/ZnCdSe MQW. He also worked on the visible blind UV sensors by ZnCdMgS compounds and related superlattices. Recently his interest included the novel terahertz detection device structures using ZnTe epilayers on sapphire substrates along with the photovoltaic devices using a Te-based Chalcopyrite materials. The recent activity also includes the thin film growth of Topological Crystal Insulator material, SnTe. Not only the film growth, but his research activity also covers wide range of characterization methods including the TEM analysis, PL characterization, various XRD techniques including pole figure analysis, and so on.
Molecular Beam Epitaxy Growth of severely lattice mismatched Te compounds and their crystallographic characterizations using XRD pole figure measurement
Masakazu Kobayashi
Department of Electrical Engineering and Bioscience
Waseda University, Tokyo Japan
Growth of severely lattice mismatched materials is always difficult, but the success could open a glorious future. In this context, MBE growth and characterization of two different materials combinations would be discussed. They are namely the rock salt structure SnTe layer growth on zincblende structure GaAs substrates and zincblende structure ZnTe layer growth on “hexagonal” Al2O3 substrates.
High temperature thermal treatment of Al2O3 substrates produces atomically flat surfaces or nano-facet structures. The orientation of the successively grown ZnTe layers were drastically affected by the direction of the substrate surface orientation as well as the surface treatment conditions.
(100) oriented layer of SnTe can be grown on (100) oriented GaAs substrate, but (111) layers can be also grown on (100) substrates. SnTe (100) single-domain thin films have been previously grown on GaAs substrates by molecular beam epitaxy but obtaining excellent crystallinity can be difficult. ZnTe buffer layers are introduced to improve the crystallinity of SnTe films. The effects of the molecular beam flux ratio (JTe/JSn) and growth temperature (Tg) on the crystallinity are investigated to achieve high-quality layers. The surface morphology and electrical properties of the SnTe thin films are also evaluated in addition to the conventional X-ray diffraction measurements. The crystallographic properties of the grown samples are shown to be significantly improved by introducing a ZnTe buffer layer. It is also found that lowering JTe/JSn to 0.6 results in a reduced growth rate, and an increased growth temperature (Tg = 220 °C) promotes the migration of atoms at the growth front. compares the θ-2θ scan and the pole figure images of a layer grown with the ZnTe buffer layer. The θ-2θ scan indicated that the layer included (001), (011), and (111) oriented crystals. (111) oriented crystal was very weak compared to others. However, the pole figure images are relatively different, and strong signals originated from (111) crystal were confirmed while (001), and (011) crystals were less pronounced. The XRD pole figure could tell the detail structural information of the thin films, while the θ-2θ scan provide the information viewed from only one particular direction. The variation of the crystal’s structures which could be observed for the severely lattice mismatched heteroepitaxial layer could be precisely understood by this powerful method.
This work was supported in part by a Waseda University Grant for Special Research Projects and was partly carried out at the Joint Research Center for Environmentally Conscious Technologies in Materials Science at ZAIKEN, Waseda University.
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